MOCVD
Our primary research tool is a 2” Veeco D180 MOCVD reactor. We have grown on both silicon and sapphire substrates and have a number of budding collaborations which are pushing the development of recipes for device structures.
TEM
We have access to both a 200kV JEOL 2500 SE and an aberration corrected 200kV JEOL 2100 TEM. These microscopes are equipped for HRTEM, STEM, EDX and EELS.
XRD
The group uses a Panalytical XRD triple axis goniometer for HRXRD measurements.
SEM
We have access to an FEI XL30 FEG SEM and an FEI Nova NanoSEM430.
AFM
For surface topography measurements, we us an Asylum Research MFP3D AFM.
FIB
For cross-sectional TEM sample preparation, our group uses an FEI Scios Dual Beam FIB/SEM.
Hall Effect
Through collaborative efforts with Professor Jerry Woodall, our group has access to an Ecopia HMS-5300 Variable Temperature (80-350K) Hall Effect Measurement System.
Class 100 clean room
The college of engineering hosts a class 100 clean room which we use for many of our chemical processing needs.