LAB EQUIPMENT
AJA Orion 8 Sputtering Chamber: Our group utilizes AJA Orion 8 UHV Sputtering system for thin film deposition. It is equipped with eight sputtering sources in a confocal configuration, which can be used to deposit multilayer system or oxides in Ar or Ar/O2 environment. The equipment has both RF sputtering option for the oxide layers and DC sputtering for the metal electrodes. The system also includes heater (up to to 850 C) and sample biasing in order to pre-treat the substrates prior to deposition to achieve a cleaner interface.
AJA Orion 8 Sputtering System (Located in Bainer Hall 1121)
Quantum Design Versalab Physical Property Measuring System: Our group uses Quantum Design Versalab System to characterize magnetic and electrical properties of the thin films and nanostructure samples. It is equipped with VSM option for magnetic measurement and ETO option for electrical measurements. A Liquid He recirculating unit is installed with Versalab to limit the need for expensive cryogens. The system is able to measure over the temperature range from 50 to 400 K and is equipped with a 3T magnet.
QD Versalab System (Located in Bainer Hall 1121)
Thermal Evaporation: Our group utilizes Edwards thermal evaporation system for thin film deposition. It is equipped with four sources, which can be used to deposit electrodes or metallic systems in vacuum environment. The system also includes heater (up to to 300 C) in order to pre-treat the substrates prior to deposition to achieve a cleaner interface.
Thermal Evaporator System (Located in Bainer Hall 1121)
Femtosecond Laser System: Our group utilizes a Femtosecond Spitfire LCX Regenerative Amplifier system to conduct ultrafast optical studies on thin films and solid state materials. This system is comprised of a Spitfire LCX regenerative amplifier, a Tsunami Ti:Sapphire femtosecond laser, a Millenia V pump laser, and a Merlin pump laser. Ghausi 1111 also contains a Magneto Optic Kerr Effect (MOKE) Magnetometer which enables our group to optically measure the magnetization of a sample. (Located in Ghausi 1111)
Femtosecond Laser System (Located in Ghausi 1111)
Park Systems XE Atomic Force Microscope (AFM): Our group utilizes a Park Systems AFM available in our Ghausi 1111 lab, which allow us to characterize surface roughenss of the thin film and nanostructure samples. The system can also perform Magnetic Force Microscopy which allows us to image magnetic domain structures with spatial resolution of 20 nm.
Park Systems XE Atomic Force Microscope/MFM (Located in Ghausi 1111)
X-RAY MEASUREMENTS AT NATIONAL USER FACILITIES
In addition to in-house lab facilities described above, our group utilizes synchrotron and x-ray free electron sources at the state-of-the-art national user facilities to characterize functional properties of magnetic and electronic materials at nanoscale. Some of the techniques our group has used previously include time-resolved x-ray diffraction, time-resolved resonant x-ray scattering, scanning transmission x-ray microscopy with x-ray magnetic circular dichroism, x-ray photon correlation spectroscopy, x-ray nanodiffraction and ptychography.
National user facilities our group uses on regular basis
Stanford Synchrotron Light Source (SSRL) at SLAC National Accelerator Laboratory (Stanford, CA)
Linac Coherent Light Source (LCLS) at SLAC National Accelerator Laboratory (Stanford, CA)
Advanced Light Source (ALS) at Lawrence Berkeley National Laboratory (Berkeley, CA)
Advanced Photon Source (APS) at Argonne National Laboratory (Chicago, IL)
National Synchrotron Light Source (NSLS-II) at Brookhaven National Laboratory (Upton, NY)
