Lab

LAB EQUIPMENT


AJA Orion 8 Sputtering Chamber: Our group utilizes AJA Orion 8 UHV Sputtering system for thin film deposition. It is equipped with eight sputtering sources in a confocal configuration, which can be used to deposit multilayer system or oxides in Ar or Ar/O2 environment. The equipment has both RF sputtering option for the oxide layers and DC sputtering for the metal electrodes. The system also includes heater (up to to 850 C) and sample biasing in order to pre-treat the substrates prior to deposition to achieve a cleaner interface.

AJA Orion 8 Sputtering System (Located in Bainer Hall 1121)

Quantum Design Versalab Physical Property Measuring System: Our group uses Quantum Design Versalab System to characterize magnetic and electrical properties of the thin films and nanostructure samples. It is equipped with VSM option for magnetic measurement and ETO option for electrical measurements. A Liquid He recirculating unit is installed with Versalab to limit the need for expensive cryogens. The system is able to measure over the temperature range from 50 to 400 K and is equipped with a 3T magnet.

QD Versalab System (Located in Bainer Hall 1121)

Thermal Evaporation: Our group utilizes Edwards thermal evaporation system for thin film deposition. It is equipped with four sources, which can be used to deposit electrodes or metallic systems in vacuum environment. The system also includes heater (up to to 300 C)  in order to pre-treat the substrates prior to deposition to achieve a cleaner interface.

Thermal Evaporator System (Located in Bainer Hall 1121)

Magnetic Property Measurement System (MPMS): Magnetic Property Measurement System (MPMS) is also available in our lab, which allow us to quantitatively characterize magnetic properties of the thin films and nanostructure samples. A Liquid He recirculating unit is currently being installed with MPMS to limit the need for expensive cryogens. The system is able to measure over the temperature range from 4 to 400 K and is equipped with a 7T magnet. (Located in Physics 260)

X-RAY MEASUREMENTS AT NATIONAL USER FACILITIES


In addition to in-house lab facilities described above, our group utilizes synchrotron and x-ray free electron sources at the state-of-the-art national user facilities to characterize functional properties of magnetic and electronic materials at nanoscale. Some of the techniques our group has used previously include time-resolved x-ray diffraction, time-resolved resonant x-ray scattering, scanning transmission x-ray microscopy with x-ray magnetic circular dichroism, x-ray photon correlation spectroscopy, x-ray nanodiffraction and ptychography.

List of national user facilities our group uses on regular basis

Stanford Synchrotron Light Source (SSRL) at SLAC National Accelerator Laboratory (Stanford, CA)

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Linac Coherent Light Source (LCLS) at SLAC National Accelerator Laboratory (Stanford, CA)

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Advanced Light Source (ALS) at Lawrence Berkeley National Laboratory (Berkeley, CA)

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Advanced Photon Source (APS) at Argonne National Laboratory (Chicago, IL)

National Synchrotron Light Source (NSLS-II) at Brookhaven National Laboratory (Upton, NY)

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